Harmful Content Injection
Critical
- Category
- Prompt Injection
- Content
## 3. Cross-validation - **Cycle-time method**: MBE units × growth time per wafer【示例值】 × annual effective hours → epitaxy capacity ceiling, vs. declared capacity - **Material balance (material-balance method)**: GaSb substrate input vs. chip output → end-to-end yield range **18–26%【示例值】**. Caliber footnote: estimated under EIA-caliber self-consistency, not the true yield; understated substrates shift the real value away from this range - **External checks**: permit execution report (pending); arsenic-waste transfer manifests (pending) - status updates: capacity → cross-validated (cycle-time method, medium confidence); yield → cross-validated (material balance, medium confidence) ## 4. Inference summary - Process route 【inferred】: T2SL cooled — MBE equipment fingerprint + arsine specialty gas + GaSb substrate, three evidence faces consistent
- Confidence
- 70% confidence
- Finding
- This content may contain harmful instructions that could cause physical harm if followed. CRITICAL: Review carefully before use.
